Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2005-07-28
2010-06-29
Huff, Mark F (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S311000, C430S394000, C716S030000, C716S030000
Reexamination Certificate
active
07745067
ABSTRACT:
Provide is a method of making a mask layout, an integrated circuit device made by a method, a computer readable medium, and a mask for forming contact holes. The method can comprise patterning a first feature along a first axis, determining a first set of areas adjacent to the first feature, wherein each of the areas in the first set of areas is within a first angle away from the first axis, and wherein each of the areas in the first set of areas is within a first distance away from the first feature, and patterning a second feature in at least one of the first set of areas so as to form a mask layout, wherein each of the first feature and the second feature are one of a virtual feature and a real feature.
REFERENCES:
patent: 6855486 (2005-02-01), Finders et al.
patent: 6928633 (2005-08-01), Teig et al.
patent: 2004/0180294 (2004-09-01), Baba-Ali et al.
Blatchford James Walter
Jessen Scott William
Alam Rashid
Brady III Wade J.
Franz Warren L.
Huff Mark F
Telecky , Jr. Frederick J.
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