4. Coating apparatus
  5. Gas or vapor deposition
  6. With treating means

Iskander Tokmouline

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Apparatus for plasma jet treatment of substrates

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Atmospheric process and system for controlled and rapid...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate

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Atmospheric process and system for controlled and rapid...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate

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Atmospheric process and system for controlled and rapid...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate

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Method for rapid thermal processing of substrates

Semiconductor device manufacturing: process – Radiation or energy treatment modifying properties of...
Reexamination Certificate

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Profile ID: LFUS-PAI-P-798544

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