Atmospheric process and system for controlled and rapid...

Details Atmospheric process and system for controlled and rapid... Atmospheric process and system for controlled and rapid...

2008-04-29

2008-04-29

Wilczewski, M. (Department: 2822)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S716000

Reexamination Certificate

active

07365019

ABSTRACT:
A system that generates an intense hot gas stream is described to etch a polymer on a substrate used in the manufacture of semiconductor and MEMS devices with no surface damage. The etching process is particularly useful to remove a polymer from relatively high aspect Height-to-Width and Width-to-Height ratio holes that can include trenches, having relatively large aspect ratios for removal of polymers used in connection with the manufacturing of microstructures.

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