4. Coating apparatus
  5. With cutting, punching or tearing of work
  6. Web or sheet work

Hyman Joseph Levinstein

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Method for forming titanium silicide in situ

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Ohmic contacts for group III-V n-type semiconductors

Coating processes – Electrical product produced – Condenser or capacitor
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Ohmics contacts of germanium and palladium alloy from group III-

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
Patent

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Radial flow reactor including glow discharge limiting shield

Coating apparatus – With cutting – punching or tearing of work – Web or sheet work
Patent

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Profile ID: LFUS-PAI-P-800396

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