Radial flow reactor including glow discharge limiting shield

Details Radial flow reactor including glow discharge limiting shield Radial flow reactor including glow discharge limiting shield

1976-01-22

1977-07-05

Kaplan, Morris

Coating apparatus

With cutting, punching or tearing of work

Web or sheet work

313210, C23C 1308

Patent

active

040332870

ABSTRACT:
An improved radio frequency (rf) powered radial flow cylindrical reactor utilizes a gas shield which substantially limits the glow plasma discharge reaction to a section of the reactor over the semiconductor substrates which are to be coated. The gas shield permits the use of higher rf input power which contributes to the formation of protective films that have desirable physical and electrical characteristics.

REFERENCES:
patent: 1560103 (1925-11-01), Schmierer
patent: 3675066 (1972-07-01), Armstrong et al.
patent: 3757733 (1973-09-01), Reinberg

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