4. Optical: systems and elements
  5. Having significant infrared or ultraviolet property
  6. Multilayer filter or multilayer reflector

Hans-Jürgen Mann

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6-mirror microlithography projection objective

Optical: systems and elements – Compound lens system – With curved reflective imaging element
Reexamination Certificate

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8-mirror microlithography projection objective

Optical: systems and elements – Compound lens system – With curved reflective imaging element
Reexamination Certificate

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8-mirror microlithography projection objective

Optical: systems and elements – Compound lens system – With curved reflective imaging element
Reexamination Certificate

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Masks, lithography device and semiconductor component

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate

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Method for distortion correction in a microlithographic...

Photocopying – Projection printing and copying cameras – Distortion introducing or rectifying
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2201134

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