6-mirror microlithography projection objective

Details 6-mirror microlithography projection objective 6-mirror microlithography projection objective

2005-03-15

2005-03-15

Nguyen, Thong Q (Department: 2872)

Optical: systems and elements

Compound lens system

With curved reflective imaging element

C359S729000, C359S731000

Reexamination Certificate

active

06867913

ABSTRACT:
There is provided a microlithography projection objective for short wavelengths, with an entrance pupil and an exit pupil for imaging an object field in an image field, which represents a segment of a ring field, in which the segment has an axis of symmetry and an extension perpendicular to the axis of symmetry and the extension is at least20mm. The objective comprises a first (S1), a second (S2), a third (S3), a fourth (S4), a fifth (S5) and a sixth mirror (S6) in centered arrangement relative to an optical axis. Each of these mirrors have an off-axis segment, in which the light beams traveling through the projection objective impinge. The diameter of the off-axis segment of the first, second, third, fourth, fifth and sixth mirrors as a function of the numerical aperture NA of the objective at the exit pupil is ≦1200 mm * NA.

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