4. Optical: systems and elements
  5. Lens
  6. Multiple component lenses

Hans-Juergen Rostalski

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Compact 1½-waist system for sub 100 nm ArF lithography

Optical: systems and elements – Lens – With field curvature shaping
Reexamination Certificate

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Lithography lens system and projection exposure system...

Optical: systems and elements – Lens – With field curvature shaping
Reexamination Certificate

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Microlithographic projection exposure apparatus

Photocopying – Projection printing and copying cameras – Step and repeat
Reexamination Certificate

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Projection exposure apparatus, projection exposure method...

Photocopying – Projection printing and copying cameras – Illumination systems or details
Reexamination Certificate

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Projection objective and projection exposure apparatus...

Optical: systems and elements – Lens – With reflecting element
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Profile ID: LFUS-PAI-P-2252378

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