Photocopying – Projection printing and copying cameras – Illumination systems or details
Reexamination Certificate
2007-05-11
2010-11-16
Nguyen, Hung Henry (Department: 2882)
Photocopying
Projection printing and copying cameras
Illumination systems or details
C355S053000
Reexamination Certificate
active
07834981
ABSTRACT:
A projection exposure apparatus for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask that is arranged in the region of an object surface of the projection objective has a light source for emitting ultraviolet light from a wavelength band having a bandwidth Δλ>10 pm around a central operating wavelength λ>200 nm; an illumination system for receiving the light from the light source and for directing illumination radiation onto the pattern of the mask; and a projection objective for the imaging of the structure of the mask onto a light-sensitive substrate. The projection objective is a catadioptric projection objective having at least one concave mirror arranged in a region of a pupil surface of the projection objective, and a negative group having at least one negative lens arranged in direct proximity to the concave mirror in a region near the pupil surface, where a marginal ray height (MRH) of the imaging is greater than a chief ray height (CRH).
REFERENCES:
patent: 620978 (1899-03-01), Schupmann
patent: 5212593 (1993-05-01), Williamson et al.
patent: 5402267 (1995-03-01), Furter et al.
patent: 6424471 (2002-07-01), Ulrich et al.
patent: 6451507 (2002-09-01), Suenaga et al.
patent: 6600608 (2003-07-01), Shafer et al.
patent: 6636350 (2003-10-01), Shafer et al.
patent: 6665126 (2003-12-01), Shafer et al.
patent: 6707616 (2004-03-01), Takahashi et al.
patent: 6806942 (2004-10-01), Schuster et al.
patent: 6831731 (2004-12-01), Omura et al.
patent: 6909492 (2005-06-01), Omura
patent: 6995918 (2006-02-01), Terasawa et al.
patent: 7362508 (2008-04-01), Omura et al.
patent: 2003/0011755 (2003-01-01), Omura et al.
patent: 2004/0160677 (2004-08-01), Epple et al.
patent: 2005/0094289 (2005-05-01), Kreuzer
patent: 2006/0082904 (2006-04-01), Kato et al.
patent: 2006/0132931 (2006-06-01), Epple et al.
patent: 2006/0268253 (2006-11-01), Dodoc
patent: 102 21 386 (2003-11-01), None
patent: 103 16 428 (2004-10-01), None
patent: 1 069 448 (2001-01-01), None
patent: 1 102 100 (2001-05-01), None
patent: WO 2004/090600 (2004-10-01), None
patent: WO 2006/125790 (2006-11-01), None
Feldmann Heiko
Rostalski Hans-Juergen
Ulrich Wilhelm
Carl Zeiss SMT AG
Nguyen Hung Henry
Sughrue & Mion, PLLC
LandOfFree
Projection exposure apparatus, projection exposure method... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Projection exposure apparatus, projection exposure method..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection exposure apparatus, projection exposure method... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4199952