Compact 1½-waist system for sub 100 nm ArF lithography

Details Compact 1½-waist system for sub 100 nm ArF lithography Compact 1½-waist system for sub 100 nm ArF lithography

2005-06-14

2005-06-14

Mack, Ricky (Department: 2873)

Optical: systems and elements

Lens

With field curvature shaping

C359S650000, C359S761000, C359S781000

Reexamination Certificate

active

06906866

ABSTRACT:
According to one exemplary embodiment, a projection lens having an object plane and an image plane is provided and includes the following lens groups listed objectwise to imagewise: (1) a first lens group having negative refractive power; and (2) at least three other lens groups having a positive refractive power and at least one other lens group having a negative refractive power. In one embodiment, the projections lens includes a second lens group having a positive refractive power; a third lens group having a negative refractive power; and fourth, fifth and sixth lens groups having overall positive refractive power. The projection lens having a numerical aperture of at least about 0.85 and is of a 1½ waist construction, with the ½ waist defined in the first lens group and a primary waist is defined in the third lens group.

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