Projection objective and projection exposure apparatus...

Details Projection objective and projection exposure apparatus... Projection objective and projection exposure apparatus...

2007-03-23

2010-06-15

Nguyen, Thong (Department: 2872)

Optical: systems and elements

Lens

With reflecting element

C359S364000, C359S366000

Reexamination Certificate

active

07738188

ABSTRACT:
A reduction projection objective for projection lithography has a plurality of optical elements configured to image an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio |β|<1. The optical elements form a dry objective adapted with regard to aberrations to a gaseous medium with refractive index n′<1.01 filling an image space of finite thickness between an exit surface of the projection objective and the image surface. The optical elements include a largest lens having a maximum lens diameter Dmaxand are configured to provide an image-side numerical aperture NA<1 in an effective image field having a maximum image field height Y′. With COMP=Dmax/(Y′·(NA
′)2) the condition COMP<15.8 holds.

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