4. Geometrical instruments

Frederick Vratny

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Apparatus and method for plasma-assisted etching of wafers

Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent

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Apparatus and method for plasma-assisted etching of wafers

Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent

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Connecting a flat-pack-packaged chip to a printed circuit board

Geometrical instruments
Patent

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Electroless deposition of gold

Coating processes – With pretreatment of the base – Metal base
Patent

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Electroless deposition of nickel on a masked aluminum surface

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
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Profile ID: LFUS-PAI-P-224485

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