4. Coating apparatus
  5. Gas or vapor deposition
  6. With treating means

Evelio Sevillano

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High growth rate plasma diamond deposition process and method of

Coating processes – Measuring – testing – or indicating – Thickness or uniformity of thickness determined
Patent

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High growth rate plasma diamond deposition process and method of

Coating processes – Measuring – testing – or indicating – Thickness or uniformity of thickness determined
Patent

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Microwave plasma reactor

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Microwave plasma reactor

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Profile ID: LFUS-PAI-P-635998

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