High growth rate plasma diamond deposition process and method of

Details High growth rate plasma diamond deposition process and method of High growth rate plasma diamond deposition process and method of

1995-01-23

1996-05-21

King, Roy V.

Coating processes

Measuring, testing, or indicating

Thickness or uniformity of thickness determined

427575, 427577, 427122, 427249, 423446, B05D 306, C23C 1650

Patent

active

055187595

ABSTRACT:
A process for depositing diamond on a substrate using a microwave plasma generator including introducing a feed which includes diamond forming constituents in a desired ratio to the microwave plasma generator, and providing sufficient microwave power to the microwave plasma generator to produce a greenish-colored plasma which emits a spectrum monitored to maintain a relative emission intensity ratio of two of the constituents in a predetermined range, for depositing high quality diamond at an extremely high rate on the substrate placed proximate or in the plasma.

REFERENCES:
patent: 4957591 (1990-09-01), Sato et al.
patent: 5110577 (1992-05-01), Tamor et al.
patent: 5314540 (1994-05-01), Nakamura et al.

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