Coating apparatus – Gas or vapor deposition – With treating means
Patent
1993-06-04
1996-09-17
Kunemund, Robert
Coating apparatus
Gas or vapor deposition
With treating means
118723E, 118723ME, 20429838, 156345, C23C 1600
Patent
active
055564755
ABSTRACT:
A microwave plasma reactor including a chamber for containing a gas to be energized into a plasma with microwave energy, an electrode having two surfaces in the chamber for radiating microwave energy from one of the surfaces into the chamber to form the plasma proximate the radiating surface, and a waveguide or coaxial conductor for introducing microwave energy onto the other of the two electrode surfaces for providing the energy to form the plasma.
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Besen Matthew M.
Sevillano Evelio
Smith Donald K.
Applied Science and Technology Inc.
Chang Joni Y.
Kunemund Robert
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