Coating apparatus – Gas or vapor deposition – With treating means
Patent
1994-03-29
1996-03-26
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
With treating means
118723MW, 118723ME, 118723MR, 156345, 20429838, C23C 1600
Patent
active
055017401
ABSTRACT:
A microwave plasma reactor including a chamber for containing a gas to be energized into a plasma with microwave energy, an electrode having two surfaces in the chamber for radiating microwave energy from one of the surfaces into the chamber to form the plasma proximate the radiating surface, and a waveguide or coaxial conductor for introducing microwave energy onto the other of the two electrode surfaces for providing the energy to form the plasma.
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Smith, Donald K., "Design and Operation of a 12 CM Diameter, 750 Watt Microwave Plasma Source," Thesis submitted at University of Wisconsin-Madison-1976, pp. 1-29.
Besen Matthew M.
Sevillano Evelio
Smith Donald K.
Applied Science and Technology Inc.
Breneman R. Bruce
Chang Joni Y.
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