4. Computer-aided design and analysis of circuits and semiconductor
  5. Design of semiconductor mask or reticle
  6. Analysis and verification

David J. Sturtevant

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Mask set for variable mask field exposure

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate

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Variable mask field exposure

Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing
Reexamination Certificate

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Yield profile manipulator

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate

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Yield profile manipulator

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2176115

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