Apparatus for exciting a plasma in a semiconductor wafer process

Details Apparatus for exciting a plasma in a semiconductor wafer process Apparatus for exciting a plasma in a semiconductor wafer process

1997-12-16

2000-03-28

Pascal, Robert

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511151, 118723R, H05H 146

Patent

active

060436077

ABSTRACT:
A method and apparatus for generating a complex waveform and coupling the waveform to a reaction chamber of a semiconductor wafer processing system using a power amplifier. Specifically, the apparatus includes a complex waveform generator coupled to a high-power amplifier. The high-power amplifier is coupled to one or more frequency selective matching networks which select bands of RF signal to be coupled to plasma excitation circuit within the semiconductor wafer processing system.

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