Electronically tuned matching networks using adjustable inductan

Wave transmission lines and networks – Coupling networks – With impedance matching

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Details

333 99PL, 343860, H01P 508

Patent

active

055721702

ABSTRACT:
A plasma processing system including a plasma processing chamber; an antenna circuit including a source antenna positioned relative to the processing chamber so as to couple energy into a plasma within the chamber during processing, the antenna circuit having a first terminal and a second terminal with the source antenna electrically coupled between the first and second terminals; and a local impedance transforming network connected to the antenna circuit, the local impedance transforming network including a first capacitor connected between the first terminal and a grounded node, and a second capacitor connected between the second terminal and the grounded node.

REFERENCES:
patent: 2238260 (1941-04-01), Hagen
patent: 3019335 (1962-01-01), Brilliant
patent: 5072231 (1991-12-01), Koyama

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