4. Semiconductor device manufacturing: process
  5. Making field effect device having pair of active regions...
  6. Having insulated gate

Chun-Hung Peng

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Method for forming via holes

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
Patent

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Method for manufacturing MOS device with adjustable source/drain

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Patent

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Method for protecting STI structures with low etching rate...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material
Reexamination Certificate

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Method for reducing antenna effect during plasma etching procedu

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Patent

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Method of forming self-aligned unlanded via holes

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

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Profile ID: LFUS-PAI-P-734147

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