Chris E. Barns

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CMOS device with metal and silicide gate electrodes and a...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate

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Complementary metal oxide semiconductor integrated circuit...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having schottky gate
Reexamination Certificate

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Etch stop and hard mask film property matching to enable...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate

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Facilitating removal of sacrificial layers via implantation...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having schottky gate
Reexamination Certificate

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Facilitating removal of sacrificial layers via implantation...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having schottky gate
Reexamination Certificate

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Profile ID: LFUS-PAI-P-1546188

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