4. Synthetic resins or natural rubbers -- part of the class 520 ser
  5. Synthetic resins
  6. From carboxylic acid or derivative thereof

Cheol Kyu Bok

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ArF photoresist copolymers

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate

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ArF photoresist copolymers

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate

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ArF photoresist copolymers

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent

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Cleaning solution for photoresist and method for forming...

Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate

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Copolymer for photoresist

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From carboxylic acid or derivative thereof
Patent

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Profile ID: LFUS-PAI-P-452460

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