Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
2007-07-03
2007-07-03
Webb, Gregory (Department: 1751)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
C510S176000, C510S245000, C510S265000
Reexamination Certificate
active
10723029
ABSTRACT:
Cleaning solutions for photoresist are disclosed which are useful for cleaning a semiconductor substrate in the last step of development when photoresist patterns are formed. Also, methods for forming photoresist patterns using the same are disclosed. The disclosed cleaning solution comprises H2O as a solution, a surfactant which is phosphate-alcoholamine salt represented by Formula 1, and an alcohol compound. The disclosed cleaning solution has lower surface tension than that of distilled water which has been used for conventional cleaning solutions, thereby improving resistance to photoresist pattern collapse and stabilizing the photoresist pattern formation.wherein R, x, y, z, a and b are as defined in the specification.
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Bok Cheol Kyu
Hwang Young Sun
Lee Geun Su
Lee Sung Koo
Moon Seung Chan
Hynix / Semiconductor Inc.
Marshall & Gerstein & Borun LLP
Webb Gregory
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