Copolymer for photoresist

Details Copolymer for photoresist Copolymer for photoresist

1997-06-24

2000-05-16

Hampton-Hightower, P.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From carboxylic acid or derivative thereof

528322, 526262, 526279, 522 31, 522 32, 522 68, 522152, 430170, 430193, 430270, C08G 7310, G03C 1495

Patent

active

060638966

ABSTRACT:
A copolymer of maleimide derivative and acrylic acid, represented by Formula I, is of high etch resistance and thermal resistance and can be used for photoresist in submicrolithography. ##STR1##

REFERENCES:
patent: 4837124 (1989-06-01), Wu et al.
patent: 5064921 (1991-11-01), Blum et al.
patent: 5223582 (1993-06-01), Blum et al.
patent: 5262500 (1993-11-01), Chiang et al.
patent: 5397680 (1995-03-01), Schadeli et al.
patent: 5585220 (1996-12-01), Breyta et al.
Yamada, Masamori, et al., "Syntheses and polymerizations of unsaturated dibasic acid derivatives", chemical abstract No. 72:212964 Kobunshi Kagaku 26(292) pp. 593-601 (1969) (Fukui University, Fukui, Japan).

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