4. Semiconductor device manufacturing: process
  5. Coating of substrate containing semiconductor region or of...
  6. By reaction with substrate

Cem Basceri

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Atomic layer deposition apparatus and methods

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With decomposition of a precursor
Reexamination Certificate

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Atomic layer deposition method

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With decomposition of a precursor
Reexamination Certificate

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Atomic layer deposition methods

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
Reexamination Certificate

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Atomic layer deposition methods

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Atomic layer deposition methods

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2053920

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