4. Electricity: electrical systems and devices
  5. Electric charge generating or conducting means
  6. Use of forces of electric charge or field

Bryan Pu

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Adjusting DC bias voltage in plasma chambers

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Patent

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Apparatus for improving wafer and chuck edge protection

Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
Patent

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Apparatus for uniformly etching a dielectric layer

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – Having glow discharge electrode gas energizing means
Reexamination Certificate

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Apparatus for uniformly etching a dielectric layer

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – Having glow discharge electrode gas energizing means
Reexamination Certificate

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Flash step preparatory to dielectric etch

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate

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Profile ID: LFUS-PAI-P-864078

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