Coating processes
Electrical product produced
Integrated circuit, printed circuit, or circuit board
Inventor
active
Deposition of silicon dioxide and silicon oxynitride films using
Deposition of silicon dioxide films at temperatures as low as 10
Deposition of silicon nitride films from azidosilane sources
Deposition of silicon oxide films using alkylsilane liquid sourc
Deposition of tungsten films from mixtures of tungsten hexafluor
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Profile ID: LFUS-PAI-P-51533