Deposition of tungsten films from mixtures of tungsten hexafluor

Details Deposition of tungsten films from mixtures of tungsten hexafluor Deposition of tungsten films from mixtures of tungsten hexafluor

1993-09-02

1995-07-18

Bell, Janyce

Coating processes

Coating by vapor, gas, or smoke

Metal coating

4272552, 4272551, 427294, C23C 1660

Patent

active

054339758

ABSTRACT:
A method of depositing tungsten films comprising heating a substrate to a temperature above 200.degree. C. in a chemical vapor deposition reactor, flowing a stream of carrier gas over the substrate in the reactor, and simultaneously introducing mixtures of WF.sub.6 and organohydrosilanes into the reactor.

REFERENCES:
patent: 4741928 (1988-05-01), Wilson et al.
patent: 4751101 (1988-06-01), Joshi
patent: 4918033 (1990-04-01), Bartha et al.
patent: 5175017 (1992-12-01), Kobayashi et al.
patent: 5230847 (1993-07-01), Jalby et al.

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