Deposition of silicon nitride films from azidosilane sources

Details Deposition of silicon nitride films from azidosilane sources Deposition of silicon nitride films from azidosilane sources

1990-02-01

1991-02-12

Silverman, Stanley

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 531, 4272481, 427255, 4272551, B05D 306

Patent

active

049922998

ABSTRACT:
A method of producing a silicon nitride film on the surface of a substrate by thermal decomposition at said surface of a compound of the class ##STR1## wherein R.sub.1 R.sub.2 and R.sub.3 are hydrogen azido, 1 to 6 carbon alkyl, phenyl, or 7 to 10 carbon alkaryl, at least one of R.sub.1, R.sub.2, and R.sub.3 being 1-6 carbon alkyl, phenyl, or 7 to 10 carbon alkaryl, ethyltriazidosilane being uniquely superior, is disclosed.

REFERENCES:
patent: 4863755 (1989-09-01), Heoo et al.

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