4. Coating apparatus
  5. Gas or vapor deposition
  6. With treating means

Akitaka Makino

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Cover ring for a plasma processing apparatus

Medical and laboratory equipment – Laboratory equipment not elsewhere specified
Design Patent

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Electrode cover for a plasma processing apparatus

Equipment for production – distribution – or transformation of ene – Distribution – modification or control – Semiconductor – transistor or integrated circuit
Design Patent

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Grounded electrode for a plasma processing apparatus

Equipment for production – distribution – or transformation of ene – Distribution – modification or control – Semiconductor – transistor or integrated circuit
Design Patent

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Method of and apparatus for securing and cooling/heating a wafer

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Plasma processing apparatus

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With measuring – sensing – detection or process control means
Reexamination Certificate

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Profile ID: LFUS-PAI-P-821836

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