Grounded electrode for a plasma processing apparatus

Details Grounded electrode for a plasma processing apparatus Grounded electrode for a plasma processing apparatus

2007-12-04

2007-12-04

Sikder, Selina (Department: 2912)

Equipment for production, distribution, or transformation of ene

Distribution, modification or control

Semiconductor, transistor or integrated circuit

Design Patent

active

29236982

CLAIM:
The ornamental design for grounded electrode for a plasma processing apparatus, as shown.

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patent: 7025862 (2006-04-01), Herchen et al.
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patent: 7138039 (2006-11-01), Burkhart et al.
patent: 2003/0066484 (2003-04-01), Morikage et al.

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