Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

2004-08-30

2008-08-26

Moore, Karla (Department: 1792)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With measuring, sensing, detection or process control means

C156S345240, C156S345370, C156S916000, C118S722000, C118S7230AN, C118S724000, C118S733000

Reexamination Certificate

active

07416633

ABSTRACT:
Described is a vacuum processing apparatus that includes a vacuum container which has a processing chamber inside thereof, wherein a plasma used for processing a sample is formed inside the processing chamber. The processing chamber has an upper side wall which surrounds a space in which the plasma is formed and contacts the plasma, and a lower side wall inside of which a sample stand, supporting the sample to be processed, is arranged. A connecting portion is provided between the upper and lower side walls, and a heater is provided for heating the upper side wall. The apparatus also includes structure at the connecting portion to impede heat transfer between the upper and lower side walls.

REFERENCES:
patent: 2002/0069970 (2002-06-01), Noorbakhsh et al.
patent: 6-267808 (1994-09-01), None
patent: 2000-173986 (2000-06-01), None
patent: 2002-533911 (2002-10-01), None
patent: WO 00/19481 (2000-04-01), None

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