Electrode cover for a plasma processing apparatus

Details Electrode cover for a plasma processing apparatus Electrode cover for a plasma processing apparatus

2007-12-11

2007-12-11

Sikder, Selina (Department: 2912)

Equipment for production, distribution, or transformation of ene

Distribution, modification or control

Semiconductor, transistor or integrated circuit

Design Patent

active

29236981

CLAIM:
The ornamental design for electrode cover for a plasma processing apparatus, as shown.

REFERENCES:
patent: D404370 (1999-01-01), Kimura
patent: D404372 (1999-01-01), Ishii
patent: D427570 (2000-07-01), Ishii
patent: 6495007 (2002-12-01), Wang
patent: 6663762 (2003-12-01), Bleck et al.
patent: 6749728 (2004-06-01), Wang
patent: D494551 (2004-08-01), Doba
patent: D494552 (2004-08-01), Tezuka et al.
patent: 6843894 (2005-01-01), Berner et al.
patent: 6908540 (2005-06-01), Kholodenko
patent: 7025862 (2006-04-01), Herchen et al.
patent: 7087144 (2006-08-01), Herchen
patent: 7138039 (2006-11-01), Burkhart et al.
patent: 2003/0066484 (2003-04-01), Morikage et al.

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