Fishing – trapping – and vermin destroying
Patent
1990-11-23
1994-05-17
Hearn, Brian E.
Fishing, trapping, and vermin destroying
437228, 427571, H01L 2100, H01L 2102, H01L 21302, H01L 21463
Patent
active
053127781
ABSTRACT:
A method for plasma processing characterized by the steps of disposing a wafer proximate to a cathode within a process chamber, releasing a gas into the chamber, applying R.F. power in the VHF/UHF frequency range to the cathode to form a plasma within the chamber, developing a magnetic field within the chamber having flux lines substantially perpendicular to the surface of the wafer, and varying the strength of the magnetic field until a desired cathode sheath voltage is attained. The apparatus includes a chamber, a wafer-supporting cathode disposed within the chamber, a mechanism for introducing gas into the chamber, an R.F. power source coupled to the cathode operating in the frequency from about 50-800 megahertz, an electromagnetic coil disposed around the chamber adapted to develop a magnetic field within the chamber which is substantially perpendicular to the wafer and a variable output power supply coupled to the coil to vary the magnetic field strength and therefore the cathode sheath voltage within the chamber.
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Ohmi, From Alchemy To Science: Technological Challenges Sep. 1, 1989.
Collins Kenneth S.
White John M.
Yang Chan-Lon
Applied Materials Inc.
Everhart B.
Heal Noel F.
Hearn Brian E.
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