Process for forming resist pattern

Details Process for forming resist pattern Process for forming resist pattern

1991-06-07

1994-07-05

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430167, 430197, 430271, 430323, 430326, 430330, 430942, 526245, 526248, 526279, G03F 730, G03F 7012

Patent

active

053266706

ABSTRACT:
A resist composition for forming a upper resist layer and a process for forming a pattern thereby are disclosed. This resist comprises an azide compound and a polyacrylic copolymer of the following formula (1): ##STR1## wherein, R.sub.1 means CH.sub.3, CF.sub.3, CN, CH.sub.2 OH, or CH.sub.2 CO.sub.2 R, wherein R means an alkyl having 1 to 5 carbon atoms

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