Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Including heating
Patent
1997-08-14
1999-08-24
Angebranndt, Martin
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Including heating
430198, 430311, 505440, 505445, 505734, 427 63, 427555, 427558, 427553, 65 172, 65 175, B05D 306
Patent
active
059423765
ABSTRACT:
Solution films of a photosensitive metal arylketone alcoholate are micro-patterned by exposure to ultraviolet radiation under a mask. The resultant patterns are developed in an apolar solvent and annealed to provide thin film metal oxides for use in integrated circuits.
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Nakao, et al.--Micro-Patterning of PbZr.sub.x Ti.sub.1-x O.sub.3 Thin Films Prepared by Photo Sensitive Sol-Gel Solution, Jpn. Appl. Phys. vol. 32 (1993) pp. 4141-4143.
Soyama, et al.--Formation of Fine-Patterned Ferroelectric Thin Film From Sol-Gel Solution Containing A Photo-Sensitive Water-Generator, (Abstract presented at the International Symposium on Applied Ferroelectrics--1994).
Soyama, et al.--Formation of Fine-Patterned Ferroelectric Thin Film From Sol-Gel Solution Containing A Photo-Sensitive Water-Generator, (Article--Proceedings of the International Symposium on Applied Ferroelectrics--1995).
Kageyama Kensuke
McMillan Larry D.
Ogi Katsumi
Paz De Araujo Carlos A.
Scott Michael C.
Angebranndt Martin
Mitsubishi Materials Corporation
Symetrix Corporation
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