Apparatus for microwave processing in a magnetic field

Details Apparatus for microwave processing in a magnetic field Apparatus for microwave processing in a magnetic field

1994-02-10

1997-03-11

Breneman, R. Bruce

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

216 70, 156345, 1566431, 118723R, H01L 21302

Patent

active

056097743

ABSTRACT:
A microwave-assisted plasma processing apparatus has a reaction chamber in which a substrate holder is provided to support a substrate to be treated. The holder is formed congruent with the inside of reaction chamber and located to substantially separate a reaction space in the reaction chamber save for a narrow clearance therebetween through which exhausted gas passes from said reaction space into said auxiliary space. By this structure, high density plasmas can be formed in the reaction chamber without substantial loss of input microwave energy.

REFERENCES:
patent: 4559100 (1985-12-01), Ninomiya et al.
patent: 4705595 (1987-11-01), Okudaira et al.
patent: 4738748 (1988-04-01), Kisa
patent: 4795529 (1989-01-01), Kawasaki et al.
patent: 4808258 (1989-02-01), Otsubo et al.
patent: 4876983 (1989-10-01), Fukuda et al.
patent: 4877509 (1989-10-01), Ogawa et al.
patent: 4926791 (1990-05-01), Hirose et al.
patent: 4950376 (1990-08-01), Hayashi et al.
patent: 4960073 (1990-10-01), Suzuki et al.
"The American Heritage Dictionary of the English Language"; .circleincircle. 1969, ISBN 395-09066-0, p. 829.
"The Relationship Between Surface Potential and Etching Characteristics With ECR Plasma"; Fujiwara et al.; 1988 Dry Process Symposium; pp. 9-14.

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