Projection system for EUV lithography

Details Projection system for EUV lithography Projection system for EUV lithography

2007-01-24

2008-05-20

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000, C359S859000

Reexamination Certificate

active

07375798

ABSTRACT:
There is provided an EUV optical projection system. The system includes a first mirror, a second mirror, a third mirror, a fourth mirror, a fifth mirror, and a sixth mirror situated in an optical path from an object plane to an image plane, for imaging an object in said object plane into an image in said image plane. The image has a width W and a secant length SL, and the width W is greater than about 2 mm.

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