Chamber leakage detection by measurement of reflectivity of...

Optics: measuring and testing – Inspection of flaws or impurities – Containers or enclosures

Reexamination Certificate

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C356S445000

Reexamination Certificate

active

06985222

ABSTRACT:
A system and method for detecting chamber leakage by measuring the reflectivity of an oxidized thin film. In a preferred embodiment, a method of detecting leaks in a chamber includes providing a first monitor workpiece, placing the first monitor workpiece in the chamber, and forming at least one film on the first monitor workpiece. The reflectivity of the least one film of the first monitor workpiece is measured, wherein the reflectivity indicates whether there are leaks in the at least one seal of the chamber. In another embodiment, the method includes providing a second monitor workpiece, placing the second monitor workpiece in the chamber, and forming at least one film on the second monitor workpiece. The reflectivity of the at least one film of the second monitor workpiece is measured, and the second monitor workpiece film reflectivity is compared to the first monitor workpiece film reflectivity.

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Wolf, Stanley, Ph.D. and Tauber, Richard N., Ph., Silicon Processing for the VLSI Era, 2000; p. 104; vol. 1: Process Technology Second Edition: Lattice Press, Sunset Beach California, U.S.

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