Method for measuring step difference in a semiconductor...

Details Method for measuring step difference in a semiconductor... Method for measuring step difference in a semiconductor...

2005-02-01

2005-02-01

Rosenberger, Richard A. (Department: 2877)

Optics: measuring and testing

Shape or surface configuration

By focus detection

C356S237400, C356S237500

Reexamination Certificate

active

06850332

ABSTRACT:
A method and an apparatus for measuring a step difference in a semiconductor device without making contact with the semiconductor device. A first beam is radiated onto a wafer so as to form a first focus on a first portion of the wafer, and a second beam is radiated onto the wafer so as to form a second focus on a second portion of the wafer. The step difference between the first portion and the second portion of the wafer is measured by calculating a vertical displacement distance of the wafer and a beam focusing device used to attain the first focus and the second focus.

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patent: 10-26515 (1998-01-01), None
patent: 10-0233621 (1999-09-01), None

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