Method of plasma load impedance tuning for engineered...

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With measuring – sensing – detection or process control means

Reexamination Certificate

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Details

C156S345440, C156S345240, C156S345200, C315S111210

Reexamination Certificate

active

08002945

ABSTRACT:
A method is provided in plasma processing of a workpiece for stabilizing the plasma against engineered transients in applied RF power, by modulating an unmatched low power RF generator in synchronism with the transient.

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