Asymmetric grounding of rectangular susceptor

Details Asymmetric grounding of rectangular susceptor Asymmetric grounding of rectangular susceptor

2011-07-05

2011-07-05

Alejandro, Luz L. (Department: 1716)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

Having glow discharge electrode gas energizing means

C118S7230ER, C118S7230AN

Reexamination Certificate

active

07972470

ABSTRACT:
An asymmetrically grounded susceptor used in a plasma processing chamber for chemical vapor deposition onto large rectangular panels supported on and grounded by the susceptor. A plurality of grounding straps are connected between the periphery of the susceptor to the grounded vacuum chamber to shorten the grounding paths for RF electrons. Flexible straps allow the susceptor to vertically move. The straps provide a conductance to ground which is asymmetric around the periphery. The straps may be evenly spaced but have different thicknesses or different shapes or be removed from available grounding point and hence provide different RF conductances. The asymmetry is selected to improve the deposition uniformity and other qualities of the PECVD deposited film.

REFERENCES:
patent: 6024044 (2000-02-01), Law et al.
patent: 6857387 (2005-02-01), Sun et al.
patent: 7083702 (2006-08-01), Blonigan et al.
patent: 2005/0255255 (2005-11-01), Kawamura et al.
patent: 2006/0060302 (2006-03-01), White et al.
patent: 8-306670 (1996-11-01), None

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