Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2007-12-25
2007-12-25
Fourson, George R. (Department: 2823)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C438S106000, C438S108000, C438S612000, C257S737000, C257S773000, C257S778000
Reexamination Certificate
active
11717691
ABSTRACT:
A wafer level chip scale package may have a gap provided between a solder bump and a bump land. The gap may be filled with a gas. A method of manufacturing a wafer level chip scale package may involve forming a redistribution line having a first opening, forming a seed metal layer having a second opening including an undercut portion, and forming the gap using the first and the second openings.
REFERENCES:
patent: 2002/0175409 (2002-11-01), Tsubodaki
patent: 2003/0052156 (2003-03-01), Kim et al.
patent: 2000-228423 (2000-08-01), None
patent: 1020020000692 (2002-01-01), None
patent: 1020030068376 (2003-08-01), None
Chung Hyun-Soo
Chung Jae-Sik
Jang Dong-Hyeon
Lee In-Young
Park Myeong-Soon
Fourson George R.
Garcia Joannie Adelle
Harness & Dickey & Pierce P.L.C.
Samsung Electronics Co,. Ltd.
LandOfFree
Wafer level chip scale package having a gap and method for... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Wafer level chip scale package having a gap and method for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Wafer level chip scale package having a gap and method for... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3834135