Coating apparatus – Gas or vapor deposition – Having means to expose a portion of a substrate to coating...
Patent
1994-01-31
1997-07-01
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Having means to expose a portion of a substrate to coating...
118715, 118725, 118728, 414935, C23C 1600
Patent
active
056433662
ABSTRACT:
A structure and method for handling and processing wafers in a face down configuration is disclosed. A robot insertion blade supports a wafer to be processed in a recess having conically sloping wafer holding surfaces which touch the wafer only at its outer periphery. Once positioned in the chamber, a set of three transfer finger with sloped contact surfaces supported from a "C" shaped support assembly raise the wafer adjacent to a susceptor bottom surface. A recess in the face of the susceptor covering a large portion of the wafer is evacuated, compared to process chamber pressure, and when the differential pressure between the processing chamber and the evacuated recess behind the wafer can support the wafer, the transfer finger supports are lower and rotated out from under the wafer and susceptor assembly. The susceptor with the wafer attached by vacuum is then lowered to a processing location in contact with shadow rings supported by the "C" shaped support assembly and opposite a gas distribution plate.
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Salzman Philip M.
Somekh Sasson R.
Vierny Oskar U.
Applied Materials Inc.
Biksa Janis
Bueker Richard
Lund Jeffrie R.
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