Via density rules

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Reexamination Certificate

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Details

C257S774000, C257S775000, C257S776000, 73, 73, 73

Reexamination Certificate

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06864171

ABSTRACT:
Thermo-mechanical stress on vias is reduced, thereby reducing related failures. This can be done by maintaining a via-to-metal area ratio at least as large as a predetermined value below which the additional stress on the vias does not significantly increase.

REFERENCES:
patent: 5357403 (1994-10-01), Haller et al.
patent: 5904569 (1999-05-01), Kitch
patent: 6037547 (2000-03-01), Blish, II
patent: 6395630 (2002-05-01), Ahn et al.
patent: 6413872 (2002-07-01), Kitch
patent: 6501186 (2002-12-01), Yu et al.

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