Variable seal pressure slit valve doors for semiconductor...

Valves and valve actuation – With means to increase head and seat contact pressure – Fluid pressure

Reexamination Certificate

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C251S030020, C251S094000, C220S240000

Reexamination Certificate

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07841582

ABSTRACT:
Techniques for a door system for sealing an opening between two chambers in a semiconductor processing system are described. A sealing member seals the opening when a door is in a closed position. To selectively open and close the opening, an actuator moves the door. A valve actuator switch provides a first or second pressure to the actuator depending on the pressure inside a first chamber. In one embodiment, a sensor monitors the pressure inside the first chamber.

REFERENCES:
patent: 6347918 (2002-02-01), Blahnik
patent: 6647665 (2003-11-01), Tabrizi et al.
patent: 6647918 (2003-11-01), Welch et al.
patent: 6905107 (2005-06-01), Blahnik
patent: 7007919 (2006-03-01), Blonigan et al.
patent: 2004/0206921 (2004-10-01), Blonigan et al.
patent: 2004/0247787 (2004-12-01), Mackie et al.

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