Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1995-10-04
1997-07-22
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20429811, C23C 1434
Patent
active
056500521
ABSTRACT:
Sputtering apparatus and method suitable for forming a step coating on a workpiece. A workpiece is supported in a chamber, particles are emitted from a sputtering source, and the particles are passed through a collimating filter having a plurality of transmissive cells positioned between the sputtering source and the workpiece to limit the angles at which the particles can be deposited onto the workpiece. The collimating filter varies in height from a center portion to an outer portion while preferably maintaining a constant cell aspect ratio.
REFERENCES:
patent: 5415753 (1995-05-01), Hurwitt et al.
patent: 5505833 (1996-04-01), Werner et al.
Edelstein Sergio
Gogh James van
Khurana Nitin
Miyamoto Keiji
Mosely Roderick C.
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