Coating apparatus – Condition responsive control – Valve actuator
Reexamination Certificate
2007-04-10
2007-04-10
Lebentritt, Michael (Department: 2812)
Coating apparatus
Condition responsive control
Valve actuator
Reexamination Certificate
active
10731651
ABSTRACT:
A valve control system for a semiconductor processing chamber includes a system control computer and a plurality of electrically controlled valves associated with the processing chamber. The system further includes a programmable logic controller in communication with the system control computer and operatively coupled to the electrically controlled valves. The refresh time for control of the valves may be less than 10 milliseconds. Consequently, valve control operations do not significantly extend the period of time required for highly repetitive cycling in atomic layer deposition processes. A hardware interlock may be implemented through the output power supply of the programmable logic controller.
REFERENCES:
patent: 4058430 (1977-11-01), Suntola et al.
patent: 4389973 (1983-06-01), Suntola et al.
patent: 4413022 (1983-11-01), Suntola et al.
patent: 4486487 (1984-12-01), Skarp
patent: 4767494 (1988-08-01), Kobayashi et al.
patent: 4806321 (1989-02-01), Nishizawa et al.
patent: 4813846 (1989-03-01), Helms
patent: 4829022 (1989-05-01), Kobayashi et al.
patent: 4834831 (1989-05-01), Nishizawa et al.
patent: 4838983 (1989-06-01), Schumaker et al.
patent: 4838993 (1989-06-01), Aoki et al.
patent: 4840921 (1989-06-01), Matsumoto
patent: 4845049 (1989-07-01), Sunakawa
patent: 4859625 (1989-08-01), Matsumoto
patent: 4859627 (1989-08-01), Sunakawa
patent: 4861417 (1989-08-01), Mochizuki et al.
patent: 4876218 (1989-10-01), Pessa et al.
patent: 4917556 (1990-04-01), Stark et al.
patent: 4927670 (1990-05-01), Erbil
patent: 4931132 (1990-06-01), Aspnes et al.
patent: 4951601 (1990-08-01), Maydan et al.
patent: 4960720 (1990-10-01), Shimbo
patent: 4975252 (1990-12-01), Nishizawa et al.
patent: 4993357 (1991-02-01), Scholz
patent: 5000113 (1991-03-01), Wang et al.
patent: 5013683 (1991-05-01), Petroff et al.
patent: 5028565 (1991-07-01), Chang et al.
patent: 5082798 (1992-01-01), Arimoto
patent: 5085885 (1992-02-01), Foley et al.
patent: 5091320 (1992-02-01), Aspnes et al.
patent: 5130269 (1992-07-01), Kitahara et al.
patent: 5166092 (1992-11-01), Mochizuki et al.
patent: 5173474 (1992-12-01), Connell et al.
patent: 5186718 (1993-02-01), Tepman et al.
patent: 5205077 (1993-04-01), Wittstock
patent: 5225366 (1993-07-01), Yoder
patent: 5234561 (1993-08-01), Randhawa et al.
patent: 5246536 (1993-09-01), Nishizawa et al.
patent: 5250148 (1993-10-01), Nishizawa et al.
patent: 5254207 (1993-10-01), Nishizawa et al.
patent: 5256244 (1993-10-01), Ackerman
patent: 5259881 (1993-11-01), Edwards et al.
patent: 5270247 (1993-12-01), Sakuma et al.
patent: 5278435 (1994-01-01), Van Hove et al.
patent: 5281274 (1994-01-01), Yoder
patent: 5286296 (1994-02-01), Sato et al.
patent: 5290748 (1994-03-01), Knuuttila et al.
patent: 5294286 (1994-03-01), Nishizawa et al.
patent: 5296403 (1994-03-01), Nishizawa et al.
patent: 5300186 (1994-04-01), Kitahara et al.
patent: 5311055 (1994-05-01), Goodman et al.
patent: 5316615 (1994-05-01), Copel
patent: 5316793 (1994-05-01), Wallace et al.
patent: 5330610 (1994-07-01), Eres et al.
patent: 5336324 (1994-08-01), Stall et al.
patent: 5338389 (1994-08-01), Nishizawa et al.
patent: 5348911 (1994-09-01), Jurgensen et al.
patent: 5374570 (1994-12-01), Nasu et al.
patent: 5395791 (1995-03-01), Cheng et al.
patent: 5438952 (1995-08-01), Otsuka
patent: 5439876 (1995-08-01), Graf et al.
patent: 5441703 (1995-08-01), Jurgensen
patent: 5443033 (1995-08-01), Nishizawa et al.
patent: 5443647 (1995-08-01), Aucoin et al.
patent: 5455072 (1995-10-01), Bension et al.
patent: 5458084 (1995-10-01), Thorne et al.
patent: 5469806 (1995-11-01), Mochizuki et al.
patent: 5480818 (1996-01-01), Matsumoto et al.
patent: 5483919 (1996-01-01), Yokoyama et al.
patent: 5484664 (1996-01-01), Kitahara et al.
patent: 5503875 (1996-04-01), Imai et al.
patent: 5521126 (1996-05-01), Okamura et al.
patent: 5527733 (1996-06-01), Nishizawa et al.
patent: 5532511 (1996-07-01), Nishizawa et al.
patent: 5540783 (1996-07-01), Eres et al.
patent: 5580380 (1996-12-01), Liu et al.
patent: 5601651 (1997-02-01), Watabe
patent: 5609689 (1997-03-01), Kato et al.
patent: 5616181 (1997-04-01), Yamamoto et al.
patent: 5637530 (1997-06-01), Gaines et al.
patent: 5641984 (1997-06-01), Aftergut et al.
patent: 5644128 (1997-07-01), Wollnik et al.
patent: 5667592 (1997-09-01), Boitnott et al.
patent: 5674786 (1997-10-01), Turner et al.
patent: 5693139 (1997-12-01), Nishizawa et al.
patent: 5695564 (1997-12-01), Imahashi
patent: 5705224 (1998-01-01), Murota et al.
patent: 5707880 (1998-01-01), Aftergut et al.
patent: 5711811 (1998-01-01), Suntola et al.
patent: 5730801 (1998-03-01), Tepman et al.
patent: 5730802 (1998-03-01), Ishizumi et al.
patent: 5747113 (1998-05-01), Tsai
patent: 5749974 (1998-05-01), Habuka et al.
patent: 5788447 (1998-08-01), Yonemitsu et al.
patent: 5788799 (1998-08-01), Steger et al.
patent: 5796116 (1998-08-01), Nakata et al.
patent: 5801634 (1998-09-01), Young et al.
patent: 5807792 (1998-09-01), Ilg et al.
patent: 5830270 (1998-11-01), McKee et al.
patent: 5835677 (1998-11-01), Li et al.
patent: 5851849 (1998-12-01), Comizzoli et al.
patent: 5855675 (1999-01-01), Doering et al.
patent: 5855680 (1999-01-01), Soininen et al.
patent: 5856219 (1999-01-01), Naito et al.
patent: 5858102 (1999-01-01), Tsai
patent: 5866213 (1999-02-01), Foster et al.
patent: 5866795 (1999-02-01), Wang et al.
patent: 5879459 (1999-03-01), Gadgil et al.
patent: 5882165 (1999-03-01), Maydan et al.
patent: 5882413 (1999-03-01), Beaulieu et al.
patent: 5904565 (1999-05-01), Nguyen et al.
patent: 5916365 (1999-06-01), Sherman
patent: 5923056 (1999-07-01), Lee et al.
patent: 5923985 (1999-07-01), Aoki et al.
patent: 5925574 (1999-07-01), Aoki et al.
patent: 5928389 (1999-07-01), Jevtic
patent: 5942040 (1999-08-01), Kim et al.
patent: 5947710 (1999-09-01), Cooper et al.
patent: 5972430 (1999-10-01), DiMeo, Jr. et al.
patent: 6001669 (1999-12-01), Gaines et al.
patent: 6015590 (2000-01-01), Suntola et al.
patent: 6025627 (2000-02-01), Forbes et al.
patent: 6036773 (2000-03-01), Wang et al.
patent: 6042652 (2000-03-01), Hyun et al.
patent: 6043177 (2000-03-01), Falconer et al.
patent: 6051286 (2000-04-01), Zhao et al.
patent: 6062798 (2000-05-01), Muka
patent: 6071808 (2000-06-01), Merchant et al.
patent: 6084302 (2000-07-01), Sandhu
patent: 6086677 (2000-07-01), Umotoy et al.
patent: 6110556 (2000-08-01), Bang et al.
patent: 6113977 (2000-09-01), Soininen et al.
patent: 6117244 (2000-09-01), Bang et al.
patent: 6124158 (2000-09-01), Dautartas et al.
patent: 6130147 (2000-10-01), Major et al.
patent: 6139700 (2000-10-01), Kang et al.
patent: 6140237 (2000-10-01), Chan et al.
patent: 6140238 (2000-10-01), Kitch
patent: 6143659 (2000-11-01), Leem
patent: 6144060 (2000-11-01), Park et al.
patent: 6158446 (2000-12-01), Mohindra et al.
patent: 6174377 (2001-01-01), Doering et al.
patent: 6174809 (2001-01-01), Kang et al.
patent: 6200893 (2001-03-01), Sneh
patent: 6203613 (2001-03-01), Gates et al.
patent: 6206967 (2001-03-01), Mak et al.
patent: 6207302 (2001-03-01), Sugiura et al.
patent: 6248605 (2001-06-01), Harkonen et al.
patent: 6270572 (2001-08-01), Kim et al.
patent: 6271148 (2001-08-01), Kao et al.
patent: 6287965 (2001-09-01), Kang et al.
patent: 6291876 (2001-09-01), Stumborg et al.
patent: 6305314 (2001-10-01), Sneh et al.
patent: 6306216 (2001-10-01), Kim et al.
patent: 6316098 (2001-11-01), Yitzchaik et al.
patent: 6676760 (2004-01-01), Kholodenko et al.
patent: 6998580 (2006-02-01), Kusuda et al.
patent: 2001/0000866 (2001-05-01), Sneh et al.
patent: 2001/0009140 (2001-07-01), Bondestam et al.
patent: 2001/0011526 (2001-08-01), Doering et al.
patent: 2001/0031562 (2001-10-01), Raaijmakers et al.
patent: 2001/0041250 (2001-11-01), Werkhoven et al.
patent: 2002/0189757 (2002-12-01), Denton et al.
patent: 2003/0033979 (2003-02-01), Kholodenko et al.
patent: 2003/0121608 (2003-07-01), Chen et al.
patent: 2005/0258162 (2005-11-01), Kusuda et al.
patent: 196 27 017 (1997-01-01), None
patent: 198 20 147 (1999-07-01), None
patent: 0 344 352 (1989-12-01), None
patent: 0 429 270 (1991-05-01), None
patent: 0 442 490 (1991-08-01), N
Chang Anzhong (Andrew)
Chang Yu
Dang Vinh
Lu Siqing
Nguyen Anh N.
Applied Materials Inc.
Dugan & Dugan PC
Lebentritt Michael
Stevenson Andre′
LandOfFree
Valve control system for atomic layer deposition chamber does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Valve control system for atomic layer deposition chamber, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Valve control system for atomic layer deposition chamber will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3743155