Coating apparatus
Gas or vapor deposition
Work support
Inventor
active
Method and apparatus for preventing edge deposition
Valve control system for atomic layer deposition chamber
No associations
LandOfFree
Anzhong (Andrew) Chang does not yet have a rating. At this time, there are no reviews or comments for this inventor.
If you have personal experience with Anzhong (Andrew) Chang, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Anzhong (Andrew) Chang will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-P-2485153