UV assisted thermal processing

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Reexamination Certificate

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Details

C438S677000

Reexamination Certificate

active

07547633

ABSTRACT:
The present invention provides methods and apparatus for performing thermal processes to a semiconductor substrate. Thermal processing chambers of the present invention comprise two different energy sources, such as an infrared radiation source and a UV radiation source. The UV radiation source and the infrared radiation source may be used alone or in combination to supply heat, activate electronic, or create active species inside the thermal processing chamber.

REFERENCES:
patent: 4588610 (1986-05-01), Yamazaki
patent: 5112647 (1992-05-01), Takabayashi
patent: 5194401 (1993-03-01), Adams et al.
patent: 5364667 (1994-11-01), Rhieu
patent: 6016383 (2000-01-01), Gronet et al.
patent: 6122439 (2000-09-01), Gronet et al.
patent: 6130415 (2000-10-01), Knoot
patent: 6215106 (2001-04-01), Boas et al.
patent: 6280183 (2001-08-01), Mayur et al.
patent: 6434327 (2002-08-01), Gronet et al.
patent: 6869892 (2005-03-01), Suzuki et al.
patent: 7125799 (2006-10-01), Aoyama et al.
patent: 2003/0186554 (2003-10-01), Tam et al.
patent: 2004/0065657 (2004-04-01), Adams et al.
patent: 2004/0241991 (2004-12-01), Aoyama et al.
patent: 2005/0142875 (2005-06-01), Yoo
patent: 2005/0254804 (2005-11-01), Aderhold et al.
patent: 2005/0263719 (2005-12-01), Ohdaira et al.
patent: 2005/0286243 (2005-12-01), Ranish et al.
patent: 2006/0251827 (2006-11-01), Nowak et al.
patent: 2007/0228289 (2007-10-01), Kaszuba et al.
patent: 2007/0257205 (2007-11-01), Rocha-Alvarez et al.
patent: 2007/0286963 (2007-12-01), Rocha-Alvarez et al.
patent: 2008/0067425 (2008-03-01), Kaszuba et al.
patent: 03 063220 (2003-07-01), None
PCT International Search Report and Written Opinion dated Apr. 3, 2008 for Application No. PCT/US2007/67774.
Zhang Article, “Ultraviolet Annealing of Tantalum Oxide Films Grown by Photo-Induced Chemical Vapour Deposition.” J. Phys. D: Appl. Phys. 32 (1999), pp. L91-L95.

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